THEBUSINESSBYES
BUREAU
NEW
DELHI, SEPTEMBER 16, 2026
Japanese firm
Fujifilm on Wednesday announced plans to invest around Rs 800 crore (USD 83
million) to set up a greenfield semiconductor materials manufacturing facility
in India, marking a significant expansion of its presence in the country’s
growing semiconductor ecosystem.
The investment will
be made in two phases beginning October 2026, with commercial production at the
proposed facility expected to commence in the 2028 fiscal year, the company
said.
“Fujifilm ... announced a landmark investment
for a new greenfield semiconductor materials manufacturing facility in India.
The project will follow a two-phase, staggered investment strategy aligned with
industry growth and customer demand, with a total investment of approximately
Rs 800 crore (around USD 83 million),” the company said in a statement.
Under the first
phase, Fujifilm will undertake manufacturing processes to support front-end
semiconductor process chemicals, the company said.
The second phase will
focus on semiconductor surface conditioning materials and high-purity
chemicals, with the scale and timing of the investment to be determined based
on the pace of development of the semiconductor industry in the years ahead.
The proposed facility
comes as India seeks to build a robust domestic semiconductor manufacturing and
materials ecosystem and attract global companies across the semiconductor value
chain.
Fujifilm said it will work closely with the vision of the India Semiconductor Mission and seek to utilise the support of the Government of India under the ISM 2.0 policy, which was approved by the government in July 2026.
The company’s planned investment is expected to strengthen domestic capabilities in semiconductor materials, an area critical to the development of advanced chip manufacturing and related technologies in India.
